4. Coating apparatus
  5. Gas or vapor deposition
  6. Chamber seal

Marcel Tognetti

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Method and arrangement for generating ultrapure steam

Chemistry of inorganic compounds – Oxygen or compound thereof – Water
Reexamination Certificate

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Reactor for manufacturing a semiconductor device

Coating apparatus – Gas or vapor deposition – Chamber seal
Reexamination Certificate

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Profile ID: LFUS-PAI-P-2738091

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