4. Chemistry: electrical and wave energy
  5. Apparatus
  6. Coating, forming or etching by sputtering

Kaihan Abidi Ashtiani

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Apparatus and method for controlling erosion profile in...

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Reexamination Certificate

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Apparatus and method for uniform, low-damage anisotropic plasma

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent

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Plasma producing method and apparatus including an inductively-c

Coating apparatus – Gas or vapor deposition – With treating means
Patent

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Profile ID: LFUS-PAI-P-1493193

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