4. Heating
  5. Heating or heat retaining work chamber structure
  6. Including baffle wall, work shield, or work support element

Jun-Geol Cho

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Apparatus for baking resists on semiconductor wafers

Heating – Heating or heat retaining work chamber structure – Including baffle wall – work shield – or work support element
Patent

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Focussing method and system of exposure apparatus

Radiant energy – Photocells; circuits and apparatus – Photocell controls its own optical systems
Reexamination Certificate

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Profile ID: LFUS-PAI-P-1558530

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