4. Machines not elsewhere specified
  5. Material working, abrading, or founding machinery
  6. Element or attachment

Jose Luis Gonzalez

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Physical vapor deposition apparatus with modified shutter...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
Reexamination Certificate

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Physical vapor deposition apparatus with modified shutter...

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Reexamination Certificate

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Shield and cover for target of sputter coating apparatus

Machines not elsewhere specified – Material working – abrading – or founding machinery – Element or attachment
Patent

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Shield and cover for target of sputter coating apparatus

Machines not elsewhere specified – Material working – abrading – or founding machinery – Element or attachment
Patent

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Shield and cover for target of sputter coating apparatus

Machines not elsewhere specified – Material working – abrading – or founding machinery – Element or attachment
Patent

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Profile ID: LFUS-PAI-P-1063257

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