4. Image analysis
  5. Applications
  6. Manufacturing or product inspection

Jeffrey A. Brigante

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Method and apparatus for combined particle location and removal

Image analysis – Applications – Manufacturing or product inspection
Reexamination Certificate

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Method and apparatus for recovery of semiconductor wafers...

Cleaning and liquid contact with solids – Processes – Combined
Reexamination Certificate

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Slurry recirculation in chemical mechanical polishing

Abrading – Machine – Rotary tool
Reexamination Certificate

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Profile ID: LFUS-PAI-P-2474003

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