4. Coating apparatus
  5. Gas or vapor deposition
  6. With treating means

Janah and Associates

Law Firm

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Apparatus and method for endpoint control and plasma monitoring

Data processing: generic control systems or specific application – Specific application – apparatus or process – Product assembly or manufacturing
Reexamination Certificate

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Ceramic composition for an apparatus and method for...

Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – With microwave gas energizing means
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Chamber having improved process monitoring window

Coating apparatus – Gas or vapor deposition – With treating means
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Chuck having pressurized zones of heat transfer gas

Electricity: electrical systems and devices – Electric charge generating or conducting means – Use of forces of electric charge or field
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Compliant bond structure for joining ceramic to metal

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
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Profile ID: LFUS-PAI-P-2012765

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