4. Coating apparatus
  5. Gas or vapor deposition
  6. With treating means

James E. Sammons, III

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Backside gas quick dump apparatus for a semiconductor wafer proc

Electricity: electrical systems and devices – Electric charge generating or conducting means – Use of forces of electric charge or field
Patent

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Plasma reactor with internal inductive antenna capable of...

Coating apparatus – Gas or vapor deposition – With treating means
Reexamination Certificate

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Plasma reactor with multiple small internal inductive antennas

Coating apparatus – Gas or vapor deposition – With treating means
Patent

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Profile ID: LFUS-PAI-P-377860

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