4. Chemistry of inorganic compounds
  5. Modifying or removing component of normally gaseous mixture
  6. Carbon dioxide or hydrogen sulfide component

I-Meen Chao

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Acid gas removal system employing regenerator with internal flas

Chemical apparatus and process disinfecting – deodorizing – preser – Chemical reactor – Waste gas purifier
Patent

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Methods for removing sulfur containing compounds and carbon...

Chemistry of inorganic compounds – Modifying or removing component of normally gaseous mixture – Carbon dioxide or hydrogen sulfide component
Reexamination Certificate

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Reclaiming of heat of reaction energy from an alkaline scrubbing

Chemistry of inorganic compounds – Modifying or removing component of normally gaseous mixture – Carbon dioxide or hydrogen sulfide component
Patent

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Profile ID: LFUS-PAI-P-266398

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