4. Chemistry: electrical and wave energy
  5. Apparatus
  6. Coating, forming or etching by sputtering

Hisashi Aida

Inventor

Rate now
  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

Inventor

active

Film deposition method and apparatus

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
Reexamination Certificate

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Film deposition method and apparatus

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
Reexamination Certificate

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Film deposition method and apparatus

Coating processes – Heat decomposition of applied coating or base material – Coating decomposed to form metal
Reexamination Certificate

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Film deposition method and apparatus for semiconductor devices

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
Reexamination Certificate

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Sputtering reactor and method of using an unbalanced magnetron

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Reexamination Certificate

  [ 0.00 ] – not rated yet Voters 0   Comments 0

No associations

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Hisashi Aida does not yet have a rating. At this time, there are no reviews or comments for this inventor.

If you have personal experience with Hisashi Aida, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Hisashi Aida will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-P-2529088

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.

Canada

 Charities
 Companies
 MP Candidates
 Patents
 Employee Salary Disclosure

World

 Places of the World
 Scientific Papers

United States

 Banks
 Companies
 Counties
 Patents
 Employee Salary Disclosure