4. Brushing, scrubbing, and general cleaning
  5. Machines
  6. Brushing

Helmuth W. Treichel

Inventor

Rate now
  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

Inventor

active

Methods for cleaning substrate surfaces after etch operations

Semiconductor device manufacturing: process – Chemical etching – Having liquid and vapor etching steps
Reexamination Certificate

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Wafer scrubbing brush core

Brushing – scrubbing – and general cleaning – Implements – Brush or broom
Reexamination Certificate

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Wafer scrubbing brush core

Brushing – scrubbing – and general cleaning – Machines – Brushing
Reexamination Certificate

  [ 0.00 ] – not rated yet Voters 0   Comments 0

No associations

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Helmuth W. Treichel does not yet have a rating. At this time, there are no reviews or comments for this inventor.

If you have personal experience with Helmuth W. Treichel, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Helmuth W. Treichel will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-P-2064391

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.

Canada

 Charities
 Companies
 MP Candidates
 Patents
 Employee Salary Disclosure

World

 Places of the World
 Scientific Papers

United States

 Banks
 Companies
 Counties
 Patents
 Employee Salary Disclosure