4. Cleaning and liquid contact with solids
  5. Processes
  6. With work or work parts movable during treatment

Haruko Ohno

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Method and apparatus for etching ruthenium films

Etching a substrate: processes – Nongaseous phase etching of substrate – Etching inorganic substrate
Reexamination Certificate

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Method of and apparatus for cleaning substrate

Cleaning and liquid contact with solids – Apparatus – With means to movably mount or movably support the work or...
Reexamination Certificate

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Method of and apparatus for cleaning substrate

Cleaning and liquid contact with solids – Processes – With work or work parts movable during treatment
Reexamination Certificate

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Profile ID: LFUS-PAI-P-2570171

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