4. Coating apparatus
  5. Gas or vapor deposition
  6. With treating means

Gerrit Jan Leusink

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Apparatus and method for preventing the premature mixture of rea

Coating apparatus – Gas or vapor deposition – With treating means
Patent

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Apparatus and method for preventing the premature mixture of...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
Reexamination Certificate

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Profile ID: LFUS-PAI-P-457125

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