4. Coating apparatus
  5. Gas or vapor deposition
  6. Multizone chamber

Fuodoor Gologhlan

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Mesh filter design for LPCVD TEOS exhaust system

Coating apparatus – Gas or vapor deposition
Reexamination Certificate

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Method of in-situ cleaning for LPCVD TEOS pump

Semiconductor device manufacturing: process – Chemical etching – Combined with coating step
Reexamination Certificate

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Method of in-situ cleaning for LPCVD teos pump

Coating apparatus – Gas or vapor deposition – Multizone chamber
Reexamination Certificate

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Profile ID: LFUS-PAI-P-2103528

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