4. Receptacles
  5. Closures
  6. With condition responsive vent or valve

David Wanamaker

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Apparatus and method for depositing low K dielectric materials

Coating apparatus – Gas or vapor deposition – With treating means
Reexamination Certificate

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Pressure responsive clamp for a processing chamber

Receptacles – Closures – With condition responsive vent or valve
Patent

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Profile ID: LFUS-PAI-P-1475919

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