4. Coating apparatus
  5. Projection or spray type
  6. Moving projector

Craig P. Meuchel

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Method and apparatus for high-pressure wafer processing and...

Drying and gas or vapor contact with solids – Process – Gas or vapor pressure is subatmospheric
Reexamination Certificate

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Method and apparatus for high-pressure wafer processing and...

Drying and gas or vapor contact with solids – Process – Gas or vapor pressure is subatmospheric
Reexamination Certificate

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Method and apparatus for high-pressure wafer processing and...

Drying and gas or vapor contact with solids – Process – Gas or vapor pressure is subatmospheric
Reexamination Certificate

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Method and apparatus for processing wafers under pressure

Drying and gas or vapor contact with solids – Process – Gas or vapor pressure is subatmospheric
Reexamination Certificate

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Method for cleaning semiconductor substrates

Cleaning and liquid contact with solids – Processes – Including application of electrical radiant or wave energy...
Reexamination Certificate

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Profile ID: LFUS-PAI-P-1236806

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