4. Optics: measuring and testing
  5. By light interference
  6. For dimensional measurement

Andrew Weeks Kueny

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Apparatus for characterization of microelectronic feature...

Semiconductor device manufacturing: process – With measuring or testing
Reexamination Certificate

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Heterodyne reflectometer for film thickness monitoring and...

Optics: measuring and testing – By light interference – For dimensional measurement
Reexamination Certificate

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Heterodyne reflectometer for film thickness monitoring and...

Optics: measuring and testing – By light interference – For dimensional measurement
Reexamination Certificate

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Method for characterization of microelectronic feature quality

Semiconductor device manufacturing: process – Including control responsive to sensed condition – Optical characteristic sensed
Reexamination Certificate

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System and method for in-situ monitor and control of film...

Semiconductor device manufacturing: process – With measuring or testing – Optical characteristic sensed
Reexamination Certificate

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Profile ID: LFUS-PAI-P-2403014

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