Thin film transistors

Metal working – Method of mechanical manufacture – Assembling or joining

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Details

148 15, 357 23, 357 4, H01L 4902, H01L 2138, H01L 21425, H01L 2922

Patent

active

044597398

ABSTRACT:
A thin film transistor has a semiconductor layer, an insulating layer and source, drain and gate electrodes. The improvement comprises creating an enhanced conductivity layer in the semiconductor by ion implantation or diffusion on phased deposition. The benefits of the enhanced conductivity layer are that transistor action is obtained without the conventional annealing step and DC stability is much improved.

REFERENCES:
patent: 3289054 (1966-11-01), Haering et al.
patent: 3405331 (1968-10-01), Skalski et al.
patent: 3419766 (1968-12-01), Ono
patent: 4332075 (1982-06-01), Ota et al.

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