Metal working – Method of mechanical manufacture – Assembling or joining
Patent
1982-12-13
1984-07-17
Weisstuch, Aaron
Metal working
Method of mechanical manufacture
Assembling or joining
148 15, 357 23, 357 4, H01L 4902, H01L 2138, H01L 21425, H01L 2922
Patent
active
044597398
ABSTRACT:
A thin film transistor has a semiconductor layer, an insulating layer and source, drain and gate electrodes. The improvement comprises creating an enhanced conductivity layer in the semiconductor by ion implantation or diffusion on phased deposition. The benefits of the enhanced conductivity layer are that transistor action is obtained without the conventional annealing step and DC stability is much improved.
REFERENCES:
patent: 3289054 (1966-11-01), Haering et al.
patent: 3405331 (1968-10-01), Skalski et al.
patent: 3419766 (1968-12-01), Ono
patent: 4332075 (1982-06-01), Ota et al.
Shepherd Frank R.
Westwood William D.
Auyang Hunter L.
Northern Telecom Limited
Weisstuch Aaron
Wilkinson Stuart L.
LandOfFree
Thin film transistors does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Thin film transistors, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Thin film transistors will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1485017