Thermally insulated thermophoretic plate

Radiant energy – Irradiation of objects or material – Irradiation of semiconductor devices

Reexamination Certificate

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C355S030000, C355S075000

Reexamination Certificate

active

10967123

ABSTRACT:
A subsystem for an exposure apparatus has a thermophoretic plate and at least one shielding layer covering a first surface of the thermophoretic plate. The at least one shielding layer controls thermally induced distortions of the exposure apparatus by reducing heat transfer between the exposure apparatus and the thermophoretic plate. The shielding layer includes an insulation layer and a reflective layer, where the reflective layer has a surface with a low emissivity. In one implementation, the reflective surface may be a surface of the thermophoretic plate. The reflective surface should be facing the exposure apparatus, but is not a requirement. More than one shielding layer may be used, in which each outermost shielding layer will have a higher temperature.

REFERENCES:
patent: 6153044 (2000-11-01), Klebanoff et al.
patent: 6253464 (2001-07-01), Klebanoff et al.
patent: 6445439 (2002-09-01), McCullough

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