Spray silylation of photoresist images

Details Spray silylation of photoresist images Spray silylation of photoresist images

1989-03-17

1991-03-12

McCamish, Marion E.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Including heating

430313, 430323, 4274071, G03F 740

Patent

active

049992805

ABSTRACT:
Photoresist images are made resistant to reactive ion etching by treating them with a poly(dimethylsilazane).

REFERENCES:
patent: 4552833 (1985-11-01), Ito et al.
patent: 4587205 (1986-05-01), Harrah et al.
patent: 4599243 (1986-07-01), Sachdev et al.
patent: 4678688 (1987-07-01), Itoh et al.
patent: 4751170 (1988-06-01), Mimura et al.
patent: 4770974 (1988-09-01), Hiraoka
patent: 4770977 (1988-09-01), Buiguez et al.
patent: 4782008 (1988-11-01), Babich et al.
Chemical Abstracts 73(4): 15349b.

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