Projection optical apparatus

Radiant energy – Photocells; circuits and apparatus – Photocell controls its own optical systems

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250225, 356124, H01J 4014

Patent

active

047016060

ABSTRACT:
A projection optical apparatus adapted for use in lithographic apparatus for semiconductor device manufacturing purposes and the like. A monitoring light beam of a given polarization is introduced into an imaging optical system of the projection optical apparatus and a polarized component of the monitoring light beam transmitted through the imaging optical system is subjected to photoelectric conversion. A variation of an optical characteristic of the imaging optical system is detected in accordance with the photoelectrically converted output signal.

REFERENCES:
patent: 4585342 (1986-04-01), Lin et al.

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