Photosensitive compositions containing polyamides acid with phot

Details Photosensitive compositions containing polyamides acid with phot Photosensitive compositions containing polyamides acid with phot

1980-05-22

1982-03-23

Brammer, Jack P.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430283, 20415919, 528184, 528185, 528170, 528208, 528211, 528322, 528327, 528331, 528340, 528342, 528350, 528353, G03C 168

Patent

active

043213197

ABSTRACT:
There is described photosensitive polymer composition and a polyimide film-coated material made by applying the composition to a support, irradiating with ultraviolet and thereafter heating. The photosensitive polymer composition is prepared by adding a sensitizer to a photosensitive polyamide acid intermediate solution which is obtained by reacting in an inert solvent a first compound comprising 100 to 5% by weight of a photosensitive group-containing diamine and 0 to 95% by weight of a diamine having no photosensitive group, with a second compound comprising at least one compound selected from a tetracarboxylic acid dianhydride and a tricarboxylic acid anhydride monohalide.

REFERENCES:
patent: 3623870 (1971-11-01), Curran et al.
patent: 3957512 (1976-05-01), Kleeberg et al.
patent: 4040831 (1977-08-01), Rubner et al.
patent: 4242437 (1980-12-01), Rohloft

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