Coating apparatus – Gas or vapor deposition – With treating means
Patent
1983-12-29
1985-05-14
Smith, John D.
Coating apparatus
Gas or vapor deposition
With treating means
118726, 118724, 118 501, 118667, 427 541, 427 38, 4221863, C23C 1312
Patent
active
045165270
ABSTRACT:
In a photochemical vapor deposition apparatus, a reaction space forming a passage for a photoreactive gas, in which reaction space a substrate is to be placed, and a discharge space, in which electric plasma discharge is generated for radiating ultraviolet rays which cause photochemical reaction of the photoreactive gas, are surrounded by the same vessel. A mercury reservoir that communicates with the discharge space by way of a communication pipe is provided outside the vessel, the communication pipe is heated at a temperature higher than that of the mercury reservoir by a heater, and the mercury reservoir is controlled in temperature by a Peltier effect element which may be cooled with a water-cooled block provided on one side thereof.
This photochemical vapor deposition apparatus can achieve photochemical vapor deposition with high efficiency, because the control of the vapor pressure of mercury for discharge is carried out easily and ultraviolet rays can be radiated with high efficiency.
REFERENCES:
patent: 3310424 (1967-03-01), Wehner et al.
patent: 3619283 (1971-11-01), Carpenter
patent: 3971968 (1976-07-01), Bachmann et al.
patent: 4265932 (1981-05-01), Peters et al.
patent: 4454835 (1984-06-01), Walsh et al.
Plantz Bernard F.
Smith John D.
Ushio Denki Kabushiki Kaisha
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