Method of producing material patterns by evaporating material th

Coating processes – Coating by vapor – gas – or smoke

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Details

118504, 427 99, 427250, 427251, 427255, 4272555, 4272557, 427282, 427 68, 427124, H05K 310, C23C 1300, C23C 1302

Patent

active

042738121

ABSTRACT:
A method of producing material patterns in which at least one substrate is fixed together with a mask to a substrate holder, and an evaporated film of desired substances is formed on the surface of the substrate by means of evaporation sources provided to confront the substrate. The mask is fabricated to have a plurality of reinforcing bridges formed in the desired portions of the mask openings of desired shape formed in the mask. The mask is held spaced from the substrate by a small distance during the evaporation, so that the evaporation may be effected at least through two pattern openings defined at both sides of each bridge. The evaporation is performed by means of evaporation sources which are located such that the line interconnecting one of the edges of each bridge and the evaporation source located at the same side with respect to the substantial bridging direction of the bridge and another line interconnecting the other edge of the bridge and the evaporation source located at the same side as the other edge intersect each other at a point on the surface of the substrate or in the clearance between the substrate surface and the mask. This method makes it possible to produce patterns which could never be produced by the conventional evaporation method.

REFERENCES:
patent: 3148085 (1964-09-01), Wiegmann
patent: 3193408 (1965-07-01), Triller
patent: 3326718 (1967-06-01), Dill
patent: 3510349 (1970-05-01), Jones
patent: 3799792 (1974-03-01), Ryng
patent: 4049857 (1977-09-01), Hammer
Ames, "Circuit Fabrication", IBM TDB vol. 5, No. 9, Feb. 1963 p. 10.
Byrne, "Mask Design for Complex Pattern Paste Application" IBM TDB vol. 18, No. 4, Sep. 1975 p. 1035.

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