Method of measuring a film thickness of multilayer thin film

Details Method of measuring a film thickness of multilayer thin film Method of measuring a film thickness of multilayer thin film

1997-06-26

1999-03-16

Rosenberger, Richard A.

G01B 1106

Patent

active

058837205

ABSTRACT:
A method of manufacturing an optical information recording medium comprising the steps of: forming a plurality of component thin films on a substrate or on a sample at a predetermined film-forming speed and within a predetermined film-forming time in sequence; measuring spectral reflectance of the multilayer thin film formed on the substrate or on the sample; comparing the measured value of the spectral reflectance and the standard value of the spectral reflectance to detect the difference between them; compensating at least one of the film-forming speed and the film-forming time based on the detected difference; and forming a plurality of thin films based on the compensated film-forming speed and with the compensated film-forming time. Consequently, a thickness of each component thin film of the optical information recording medium can be measured easily and production loss in measuring a film-forming speed can be decreased.

REFERENCES:
patent: 5410411 (1995-04-01), Uchida et al.
patent: 5493401 (1996-02-01), Horie et al.
patent: 5604581 (1997-02-01), Liu et al.
patent: 5724145 (1998-03-01), Kondo et al.

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