Method for producing thin-film magnetic recording medium

Coating processes – Electrical product produced – Integrated circuit – printed circuit – or circuit board

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427 42, 427128, 427129, 427132, 427251, 4272553, 427296, H01F 1002

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049486268

ABSTRACT:
A method for producing a thin-film magnetic recording medium having an improved corrosion resistance and which permits production of the medium at a high speed. A magnetic material vapor flow from an evaporation source and a gas or ion flow are applied to a nonmagnetic base in an evaporation chamber and the two flows reacted with each other to form the thin-film magnetic layer on the nonmagnetic base. During this process, the expression P.sub.1 /P.sub.0 .ltoreq.0.1 is maintained, wherein P.sub.0 represents the degree of vacuum in the evaporation chamber, under a first condition where only the gas or ion flow is applied after the pressure in the chamber has been reduced to a predetermined degree of vacuum, and P.sub.1 represents the degree of vacuum in the chamber under a second condition where the magnetic material vapor flow is applied to the nonmagnetic base simultaneously with the gas or ion flow. The rate of formation of the thin-film magnetic layer is 200 .ANG./sec or more on the average.

REFERENCES:
patent: 4450186 (1984-05-01), Shinohara

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