Insulating film having electrically conducting portions

Details Insulating film having electrically conducting portions Insulating film having electrically conducting portions

1982-05-20

1989-02-07

James, Andrew J.

357 59, 357 2, H01L 2978

Patent

active

048035289

ABSTRACT:
A method for fabricating adjacent electrically conducting and insulating regions in a silicon film is described. A substantially insulating layer of oxygenated, N or P doped, non-single crystalline silicon film is first formed. The film is then selectively laser irradiated so as to form an irradiated portion which is substantially conducting.

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