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High density plasma process for silicon thin films

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of...
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High density plasma process for the formation of silicon...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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High dielectric constant material deposition to achieve high...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Multiple layers
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High dielectric constant materials

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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High dielectric constant materials

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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High dielectric constant metal oxide gate dielectrics

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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High dielectric constant metal oxide gate dielectrics

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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High efficiency photoresist coating

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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High modulus filler for low k materials

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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High performance CMOS transistors using PMD liner stress

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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High performance MIS capacitor with HfO 2 dielectric

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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High quality silicon oxide films by remote plasma CVD from...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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High quantum efficiency silicon nanoparticle embedded SiO X...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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High rate silicon dioxide deposition at low pressures

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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High rate silicon nitride deposition method at low pressures

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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High reflector tunable stress coating, such as for a MEMS...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – By reaction with substrate
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High stress diamond like carbon film

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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High stress nitride film and method for formation thereof

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of...
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High temperature and chemical resistant process for wafer...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of...
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High temperature annealing of spin coated Pr1-xCaxMnO3 thim...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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