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Method for forming a shallow trench isolation structure

Semiconductor device manufacturing: process – Chemical etching – Combined with the removal of material by nonchemical means
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Method for forming a shallow trench isolation structure in a...

Semiconductor device manufacturing: process – Chemical etching – Combined with the removal of material by nonchemical means
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Method for forming a top interconnection level and bonding...

Semiconductor device manufacturing: process – Chemical etching – Combined with the removal of material by nonchemical means
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Method for forming an integrated barrier/plug for a stacked...

Semiconductor device manufacturing: process – Chemical etching – Combined with the removal of material by nonchemical means
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Method for forming capacitor of semiconductor device

Semiconductor device manufacturing: process – Chemical etching – Combined with the removal of material by nonchemical means
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Method for forming contact plugs of a semiconductor device

Semiconductor device manufacturing: process – Chemical etching – Combined with the removal of material by nonchemical means
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Method for forming dummy pattern areas in a semiconductor device

Semiconductor device manufacturing: process – Chemical etching – Combined with the removal of material by nonchemical means
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Method for forming dummy structures for improved CMP and...

Semiconductor device manufacturing: process – Chemical etching – Combined with the removal of material by nonchemical means
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Method for forming fine metal patterns by using damascene...

Semiconductor device manufacturing: process – Chemical etching – Combined with the removal of material by nonchemical means
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Method for forming identifying characters on a silicon wafer

Semiconductor device manufacturing: process – Chemical etching – Combined with the removal of material by nonchemical means
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Method for forming isolation layer in semiconductor device

Semiconductor device manufacturing: process – Chemical etching – Combined with the removal of material by nonchemical means
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Method for forming metal filled semiconductor features to...

Semiconductor device manufacturing: process – Chemical etching – Combined with the removal of material by nonchemical means
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Method for forming multi-level metal interconnection

Semiconductor device manufacturing: process – Chemical etching – Combined with the removal of material by nonchemical means
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Method for forming pattern in semiconductor device

Semiconductor device manufacturing: process – Chemical etching – Combined with the removal of material by nonchemical means
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Method for forming patterned features at a semiconductor...

Semiconductor device manufacturing: process – Chemical etching – Combined with the removal of material by nonchemical means
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Method for forming plug of semiconductor device

Semiconductor device manufacturing: process – Chemical etching – Combined with the removal of material by nonchemical means
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Method for forming self-align stop layer for borderless...

Semiconductor device manufacturing: process – Chemical etching – Combined with the removal of material by nonchemical means
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Method for forming self-aligned vias in multi-metal integrated c

Semiconductor device manufacturing: process – Chemical etching – Combined with the removal of material by nonchemical means
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Method for forming shallow trench isolation with global planariz

Semiconductor device manufacturing: process – Chemical etching – Combined with the removal of material by nonchemical means
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Method for forming square-shouldered sidewall spacers and...

Semiconductor device manufacturing: process – Chemical etching – Combined with the removal of material by nonchemical means
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