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Two-step anisotropic etching process for patterning a layer with

Adhesive bonding and miscellaneous chemical manufacture – Delaminating processes adapted for specified product – Delaminating in preparation for post processing recycling step
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Two-step chemical mechanical polishing process for producing flu

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Two-step plasma process for selective anisotropic etching of pol

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UHV compatible lift-off method for patterning nobel metal silici

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Ultra high purity vapor phase treatment

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Ultra-black coating due to surface morphology

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Ultrasonic method

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Ultrasonic paper welding

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Undercut membrane mask for high energy photon patterning

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Uniform and repeatable plasma processing

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Uniform etching of silicon (doped and undoped) utilizing ions

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Uniform treatment of large quantities of small parts

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Uniformity for magnetically enhanced plasma chambers

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Uniformity of copper etching in the fabrication of multilayer pr

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Uniformity using stagnant silylation

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Unitary type-carrier elements and method of making same

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Universal coupling member for two shafts and method of manufactu

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Universal focus multiplanar camera

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Use of a clean up step to form more vertical profiles of polycry

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Use of a faceted etch process to eliminate stringers

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