Method of forming magnetic layer pattern

Details Method of forming magnetic layer pattern Method of forming magnetic layer pattern

2007-02-27

2007-02-27

Tugbang, A. Dexter (Department: 3729)

Metal working

Method of mechanical manufacture

Electrical device making

C029S603010, C029S603030, C029S603130, C029S603140, C360S125330, C360S123090

Reexamination Certificate

active

10995464

ABSTRACT:
Provided is a method of manufacturing a thin film magnetic head capable of achieving compatibility between preventing the occurrence of side erasing and securing overwrite characteristics. When a pole portion layer as a portion where a magnetic flux is emitted is formed, a photoresist pattern is formed so that two frame portions which determine an aperture have a different width from each other, and then the photoresist pattern is heated to deform the frame portions. Thereby, the width of the aperture is gradually reduced toward a seed layer. After that, a precursor pole portion layer is formed in the aperture of the photoresist pattern, and the precursor pole portion layer is polished so as to form an air bearing surface, thereby the pole portion layer is formed so that an exposed surface exposed to the air bearing surface has an asymmetrical inverted trapezoidal shape. On the basis of the characteristic shape of the exposed surface, compatibility between preventing the occurrence of side erasing and securing the overwrite characteristics is achieved.

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