Wafer holding fixture for chemical reaction processes in rapid t

Stock material or miscellaneous articles – Structurally defined web or sheet – Including variation in thickness


Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0


428408, 428698, 428 9, 428 344, 428 64, 428 65, 428174, 428177, 428166, 428220, 156610, 219 10491, 118725, B32B 302, C23C 1600




A semiconductor wafer holding and support fixture having a low effective thermal mass comprises a planar surface having a recess for a wafer and consisting essentially of chemical vapor deposited silicon carbide. The wafer holder is specifically designed to isolate the wafer from regions of significant thermal mass of the holder. The wafer holder is particularly adapted for accomplishing chemical reactions in rapid thermal processing equipment in the fabrication of electronic integrated circuits. The method for making such an article comprises shaping a substrate, e.g. graphite, to provide a planar surface having a recess installing means for masking any regions of the substrate where silicon carbide is not desired, chemically vapor depositing a conformal outer coating of silicon carbide onto the substrate, removing the means for masking and removing the graphite by machining, drilling, grit-blasting, dissolving and/or burning.

patent: 4417347 (1983-11-01), Muka et al.
patent: 4481406 (1984-06-01), Muka
patent: 4499354 (1985-02-01), Hill et al.
patent: 4512825 (1985-04-01), Addamiano et al.
patent: 4522149 (1985-06-01), Garbis et al.
patent: 4633051 (1986-12-01), Olson
patent: 4710428 (1987-12-01), Tamamizu et al.
patent: 4722762 (1988-02-01), Luhleich et al.
patent: 4767666 (1988-08-01), Bunshah et al.
patent: 4772498 (1988-09-01), Bertin et al.
patent: 4816338 (1989-03-01), Terasaki et al.
patent: 4830919 (1989-05-01), Shuford
U.S. Ser. No. 933,007, Filed Nov. 20, 1986, entitled "Silicon Carbide Capillaries".


Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.


Wafer holding fixture for chemical reaction processes in rapid t does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Wafer holding fixture for chemical reaction processes in rapid t, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Wafer holding fixture for chemical reaction processes in rapid t will most certainly appreciate the feedback.

Rate now


Profile ID: LFUS-PAI-O-1425235

All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.