Glass manufacturing – Processes
C065S017200, C065S017300, C065S017400, C065S066000, C065S102000, C065S111000, C501S054000, C501S055000, C501S065000, C501S066000, C501S068000, C501S069000, C501S070000, C501S072000
As a jig material to use under plasma reaction for producing semiconductors, the present invention provides a quartz glass having resistance against plasma corrosion, particularly corrosion resistance against fluorine-based plasma gases, and which is usable without causing anomalies to silicon wafers; the present invention furthermore provides a quartz glass jig, and a method for producing the same. A quartz glass containing 0.1 to 20 wt % in total of two or more types of metallic elements, said metallic elements comprising at least one type of metallic element selected from Group 3B of the periodic table as a first metallic element and at least one type of metallic element selected from the group consisting of Mg, Ca, Sr, Ba, Sc, Y, Ti, Zr, Hf, lanthanoids, and actinoids as a second metallic element, provided that the maximum concentration of each of the second metallic elements is 1.0 wt % or less.
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Green Anthony J
Radar Fishman & Grauer PLLC
Shin-Etsu Quartz Products Co. Ltd.
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