Etching of nanoscale structures on high temperature superconduct

Superconductor technology: apparatus – material – process – Processes of producing or treating high temperature... – With material removal by etching – laser ablation – or...

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

505701, 505702, 505728, 427 62, 427 63, 156643, 156655, 156656, 2504922, H01L 2100

Patent

active

053045351

ABSTRACT:
A process for etching with a scanning tunneling microscope on both a single crystal and a thin film of high temperature superconductor is disclosed.

REFERENCES:
patent: 4343993 (1982-08-01), Binnig et al.
patent: 4550257 (1985-10-01), Binnig et al.
patent: 4829507 (1989-05-01), Kazan et al.
patent: 4896044 (1990-01-01), Li et al.
patent: 4956335 (1990-09-01), Agostinelli et al.
patent: 4966885 (1990-10-01), Hebard
patent: 5015323 (1991-05-01), Gallagher
patent: 5021672 (1991-06-01), Parkinson
"Atomic-Scale Surface Modifications Using a Tunnelling Microscope"; Nature; vol. 325, Jan. 29, 1987, pp. 419-421.
"Topography and Local Modification of the HoBa.sub.2 Cu.sub.3 O.sub.7-x (001) Surface Using Scanning Tunneling Microscopy"; Appl Phys. Lett; vol. 53; No. 24, Dec. 12, 1988; pp. 2447-2449.
Harmer et al., J. Appl. Phys., vol. 70, No. 5, Sep. 1991.
Parks et al., Appl. Phys. Lett., vol. 59, No. 12, Sep. 1991.
Heinzelmann et al., Appl. Phys. Lett., vol. 53, No. 24, Dec. 1988.
Wichramasinghe, H. K., Scientific American, 98-105, Oct. (1989).
Rabe, J. P., Agnew. Chem. Int. Ed. Engl., 28(1): 117-122 (1989).
Hansma, P. K., et al., Science, 242: 209-216 (1988).
McCord, M. A. et al., J. Vac. Sci. Technol. B6(1):86-88 (1986).
McCord, M. A. et al., J. Vac. Sci. Technol. B6(1):292-296 (1988).
Research Disclosure No. 28130, Sep. (1987).
Schneir, J. et al., J. Appl. Phys., 63(3): 717-721 (1988).
Schneir, J. et al., Langmuir, 3: 1025-1027 (1987).
McCord, M. A. et al., J. Vac. Sci. Technol., B6(6): 1977-1880 (1988).
Emch, R. et al., J. Appl. Phys., 65(1): 79-84 (1989).
Staufer, U. et al., J. Vac. Sci. Technol., A6:537-539 (1988).
Ringger, M. et al., Appl. Phys. Lett., 46(9): 832-834 (1985).
van Loener, E. J., et al., Appl. Phys. Lett., 55(13): 1312-1314 (1989).
Jaklevic, R. C. et al., Phys. Rev. Lett., 60(2): 120-123 (1988).
Garfunkel, E. et al., Science, 246: 99-100 (1989).
Becker, R. S. et al., Nature, 325: 419-421 (1987).
Laiho, R. et al., Journal of Microscopy, 152(2): 407-413, Nov. (1988).
Heinzelmann, H. et al., Journal of Microscopy, 152(2): 399-405, Nov. (1988).
Heinzelmann, H., et al., Appl. Phys. Lett., 53(24): 2447-2449, Dec. (1988).
Albrecht, T. R., et al., G. L. Report No. 4526 Preprint, Jun. (1989).

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Etching of nanoscale structures on high temperature superconduct does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Etching of nanoscale structures on high temperature superconduct, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Etching of nanoscale structures on high temperature superconduct will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-19751

All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.