Crystalline oxide material

Chemistry of inorganic compounds – Silicon or compound thereof – Oxygen containing

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502 80, 502 84, 502150, 502242, 502240, 208 46, 208108, 208111, 208113, 208120, 208134, 208135, 585407, 585480, 585481, C01B 3334

Patent

active

052502775

ABSTRACT:
There is provided a crystalline oxide material with a characteristic X-ray diffraction pattern. This material may be a layered material, which is swollen or pillared. Upon calcination of the swollen material, the layers collapse and condense upon one another in a somewhat disordered fashion to form a non-swellable material. However, the swollen layered material may be intercalated with polymeric oxide pillars to maintain layer separation, even after calcination.

REFERENCES:
patent: 4439409 (1984-03-01), Puppe et al.
patent: 4859648 (1989-08-01), Landis et al.
patent: 4954325 (1990-09-01), Rubin et al.

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