Apparatus for simultaneous molecular beam deposition on a plural

Coating processes – Electrical product produced – Integrated circuit – printed circuit – or circuit board

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118719, 118723, 118728, 118729, 118730, 118726, C23C 1426, C23C 1456

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046817735

ABSTRACT:
Apparatus is described which is especially well suited for simultaneous molecular beam epitaxy of materials, such as silicon, on a plurality of substrates.

REFERENCES:
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patent: 3662708 (1972-05-01), Shrader
patent: 3785853 (1974-01-01), Kirkman et al.
patent: 3928092 (1975-12-01), Ballamy et al.
patent: 4121537 (1978-10-01), Maruyama
patent: 4137865 (1979-02-01), Cho
patent: 4201152 (1980-05-01), Luscher
patent: 4226208 (1980-10-01), Nishida et al.
patent: 4256780 (1981-03-01), Gaerttner et al.
patent: 4430183 (1984-02-01), Schuller et al.
Journal of Crystal Growth, vol. 45, pp. 287-291, 1978.
Journal of Applied Physics, vol. 48, pp. 3395-3399, Aug. 1977.

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